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gaussian beam in Laser Heating of a Silicon Wafer

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Hi i refer to the tutorial of laser heating on silicon wafer for Comsol 5.3: www.comsol.com/model/download/383241/models.mph.laser_heating_wafer.pdf

In the tutorial the gaussian beam profile was given in the following equation:
(p_laser/(2*pi*r_spot^2))*exp(-r_focus^2/(2*r_spot^2))

How was this equation derived? from literature most gaussian beam profile are given in the following instead:
((2*p_laser)/(pi*r_spot^2))*exp(-(2*r_focus^2)/r_spot^2)


I tried finding the forum but there is nothing written about this.

1 Reply Last Post May 19, 2017, 9:48 a.m. EDT
Walter Frei COMSOL Employee

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Posted: 7 years ago May 19, 2017, 9:48 a.m. EDT
Dear Joel,

You're correct, this example was using a normalization of the Gaussian that isn't typical in the literature (although it did still give the correct total heat load.) Thank you for reporting this. The updated model is available here:
www.comsol.com/model/laser-heating-of-a-silicon-wafer-13835

Best Regards,
Dear Joel, You're correct, this example was using a normalization of the Gaussian that isn't typical in the literature (although it did still give the correct total heat load.) Thank you for reporting this. The updated model is available here: https://www.comsol.com/model/laser-heating-of-a-silicon-wafer-13835 Best Regards,

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